PRODUCT

Layout Beamer

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Electron-Beam À» ÀÌ¿ëÇÑ Æ÷Å丮¼Ò±×·¡ÇÇ Àåºñ ¹× Direct Writing
ÀåºñÀÇ Data Preparation ¼ÒÇÁÆ®¿þ¾î

Photomask Á¦ÀÛ ¹× Wafer ¿¡ Á÷Á¢ Exposure ÇÏ¿© ¹Ì¼¼ÆÐÅÏÀ» ¸¸µå´Â E-beam Lithography Àåºñ´Â Beam Exposure
½Ã¿¡ ³ôÀº Acceleration Voltage ¿¡ ÀÇÇÏ¿© Beam Scattering ¹× Process ¿µÇâÀ¸·Î ÀÎÇÏ¿© µðÀÚÀÎµÈ ÆÐÅÏ°ú ´Ù¸¥ °á°ú¸¦
¾ò°Ô µÇ¹Ç·Î ÀÌ·¯ÇÑ ¿¡·¯ À²À» ÁÙÀ̱â À§ÇÏ¿© °øÁ¤ Àü µ¥ÀÌÅÍ Áغñ°úÁ¤¿¡¼­ Layout BEAMER Software ´ÂExposure ½Ã Beam ÀÇ ºÐ»êÀ¸·Î ÀÎÇÑ ±ÙÁ¢È¿°ú (Proximity Effect) µî¿¡ ÀÇÇÑ ¿¡³ÊÁö ºÒ±ÕÇü Çö»óÀ» ¿©·¯ °¡Áö ±â¼úÀ» ÀÌ¿ëÇÏ¿© ±ÕµîÇÏ°Ô Beam ¿¡³ÊÁö°¡ Àü´ÞµÉ ¼ö ÀÖµµ·Ï º¸Á¤ÇÏ´Â ÇöÁ¸ÇÏ´Â °¡Àå ½±°í Á¤±³ÇÑ Proximity Effect Correction Software ÀÔ´Ï´Ù. ½±°Ô ÀÌÇØÇÒ ¼ö ÀÖÀ¸¸ç ¸Å¿ì ºü¸£°í °£ÆíÇÏ°Ô »ç¿ëÀÌ °¡´ÉÇϵµ·Ï GUI (Graphic User Interface) system À¸·Î µÇ¾î
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Beam Exposure (³ë±¤) ½Ã °¡Àå ÀÌ»óÀûÀ¸·Î µðÀÚÀÎµÈ ÆÐÅÏ¿¡ ±ÙÁ¢Çϵµ·Ï µ¥ÀÌÅ͸¦ ÁغñÇÒ ¼ö ÀÖ´Â ¼ÒÇÁÆ®¿þ¾îÀÔ´Ï´Ù.

  • ´ëºÎºÐÀÇ Main Layout Format ¹× E-beam ÀåºñÀÇ ¸ðµç Format Áö¿øÀÌ °¡´ÉÇÕ´Ï´Ù.
  • Ư¼öÇÏ°Ô µðÀÚÀεǰųª º¹ÀâÇÏ°Ô °î¼± ó¸®µÈ ·¹À̾ƿô º¸¿ÏÀÌ °¡´ÉÇÑ ÃÖ»óÀÇ ¼ÒÇÁÆ®¿þ¾î ÀÔ´Ï´Ù.
  • Field, Beam Shot, Beam Position, Writing Strategy ¹× Writing Order ÀÇ ÃÖÀûÈ­°¡ °¡´ÉÇÕ´Ï´Ù.
  • °ú°Å ¸ðµç ·¹À̾ƿô ÇÁ·Î¼¼½º ¼ø¼­¸¦ ÀúÀåÇØ µÎ¾ú´Ù°¡ ÇѹøÀÇ Å¬¸¯¸¸À¸·Î Open Çؼ­ »ç¿ëÇÒ ¼ö ÀÖ´Â
    ¶óÀ̺귯¸® ±â´ÉÀÌ °¡´ÉÇÕ´Ï´Ù.
  • ÅëÇÕµÈ Layout Editor ÀÔ´Ï´Ù.
  • ºü¸¥ °Ë»ç ¹× ½Å¼ÓÇÏ°í Æ÷°ýÀûÀÎ °ËÁõÀ» ¼öÇàÇÏ´Â °­·ÂÇÑ ±â´ÉÀÇ Viewer °¡ žÀçµÇ¾î ÀÖ½À´Ï´Ù.
  • ¸Å¿ì °­·ÂÇÑ ±ÙÁ¢È¿°ú (Proximity Effect) ¿Í °øÁ¤È¿°ú (Process Effect) º¸Á¤±â¼úÀÌ ¶Ù¾î ³³´Ï´Ù.
  • Èí¼ö ¿¡³ÊÁö¿Í ÀúÇ× °î¼±¿¡ ÀÇÇÑ ºö ºÐ»ê ½Ã¹Ä·¹ÀÌ¼Ç ±â´ÉÀÌ Å¾ÀçµÇ¾î ÀÖ½À´Ï´Ù.
  • »õ·Î¿î Layout ÀÇ µðÀÚÀÎ ¹× ¼öÁ¤ÀÌ °¡´ÉÇÕ´Ï´Ù.
  • Exposure Àü Image Simulation ÀÌ °¡´ÉÇÏ¿© Exposure Àü¿¡ °á°ú ¿¹ÃøÀÌ °¡´ÉÇÕ´Ï´Ù.